INFOS 2011, Grenoble, France
発表資料一覧
来山 大祐
Effect of Thin Si Insertion at Metal Gate/High-k Interface on Electrical Characteristics of MOS Device with La
2
O
3
Dariush Hassan Zadeh
Effects of surface treatment on electric properties of W/high-k/In
0.53
Ga
0.47
As capacitors