Insulating Films on Semiconductors(INFOS 2009)
発表資料一覧
岩井 洋
Roadmap for 22nm and beyond
宋 在烈
Post metalization annealing study in La
2
O
3
/Ge MOS structure
川那子 高暢
Experimental study for high effective mobility with directly deposited HfO
2
/La
2
O
3
MOSFET