Society Activity



ESSDERC 2010
Kiichi Tachi 3D Source/Drain Doping Optimization in Multi-Channel MOSFET
Soushi Sato Gate Semi-Around Si Nanowire FET Fabricated by Conventional CMOS Process with Very High Drivability
Takamasa Kawanago Optimized Oxygen Annealing Process for Vth Tuning of p-MOSFET with High-k/Metal Gate Stacks