Society Activity
ESSDERC 2010
Kiichi Tachi
3D Source/Drain Doping Optimization in Multi-Channel MOSFET
Soushi Sato
Gate Semi-Around Si Nanowire FET Fabricated by Conventional CMOS Process with Very High Drivability
Takamasa Kawanago
Optimized Oxygen Annealing Process for V
th
Tuning of p-MOSFET with High-k/Metal Gate Stacks